ATP » Staff » Christian Wölfel

Dr.-Ing. Christian Wölfel

Postdoc


Address:

Ruhr-Universität Bochum
Lehrstuhl für Automatisierungstechnik und Prozessinformatik
Fakultät für Elektrotechnik und Informationstechnik
Postfach ID 14
Universitätsstrasse 150
D-44780 Bochum


Room:

Building ID, Level 2, Room 527

Phone:

++49/234 32-23105

E-Mail:

E-Mail: lastname@atp.rub.de



Research:

Modeling and control of plasma-based surface treatment


Lecture assistence:

Winterterm:

Summerterm:


Publications:

2022


  • J. Roggendorf, B. Berger, D. Eremin, M. Oberberg, D. Engel, C. Wölfel, Q.-Z. Zhang, P. Awakowicz, J.
    Lunze, J. Schulze:
    Experimental investigations of plasma dynamics in the hysteresis regime of reactive RF sputter processes,
    Plasma Sources Science and Technology (2022).

2021


  • C. Wölfel, M. Oberberg, B. Berger, D. Engel, R.P. Brinkmann, J. Schulze, P. Awakowicz, J. Lunze:
    Control-oriented plasma modeling and controller design for reactive sputtering
    IFAC Journal of Systems and Control (2021)
    https://doi.org/10.1016/j.ifacsc.2021.100142

2020


  • M. Oberberg, B. Berger, M. Buschheuer, D. Engel, C. Wölfel, D. Eremin, J. Lunze, R.P. Brinkmann,
    P. Awakowicz, J. Schulze:
    The Magnetic Asymmetry Effect in geometrically asymmetric capacitively coupled radio frequency discharges
    operated in Ar/O2

    Plasma Sources Science and Technology (2020)
    https://doi.org/10.1088/1361-6595/ab9b31
  • C. Wölfel, M. Oberberg, D. Bockhorn, P. Awakowicz, J. Lunze:
    Electron Plasma Frequency Feedback Control for Reactive RF Magnetron Sputtering Processes
    Society of Vacuum Coaters Bulletin / Fall-Winter (2020)

2019


  • C. Wölfel, M. Oberberg, P. Awakowicz, J. Lunze:
    Plasma State Control of Reactive Sputter Processes
    Proc. of the 6th International Conference of Control, Dynamic Systems, and Robotics,Ottawa, Canada, 2019
    https:\\doi.org\10.11159/cdsr19.107
  • C. Wölfel, M. Oberberg, B. Bergner, D. Engel, R.P. Brinkmann, P. Awakowicz, J. Lunze, J. Schulze:
    The Multipole Resonance Probe-based controller: A technology to investigate plasma-based deposition
    Journal of Instrumentation (2019)
    https:\\doi.org\10.1088/1748-0221/14/10/P10007 .
  • M. Oberberg, D. Engel, B. Berger, C. Wölfel, D. Eremin, J. Lunze, R.P. Brinkmann, P. Awakowicz, J. Schulze:
    Magnetic control of non-linear electron resonance heating in a capacitively coupled radio frequency discharge
    Plasma Sources Science and Technology (2019),
    https:\\doi.org\10.1088/1361-6595/ab53a0
  • C. Wölfel, D. Bockhorn, P. Awakowicz, J. Lunze:
    Model approximation and stabilization of reactive sputter processes
    Journal of Process Control, Volume 83,  pp.: 121-128, 2019,
    https://doi.org/10.1016/j.jprocont.2018.06.009

2018


  • C. Wölfel, J. Lunze:
    Stabilisierung reaktiver Sputterprozesse: Modellbildung - Reglerentwurf - Experimentelle Erprobung
    52. Regelungstechnisches Kolloquium in Boppard, 2018.
  • M. Oberberg, S. Ries, C. Wölfel, J. Harhausen, D. Pohle, C. Schulz, O. Schmidt, W. Dobrygin, I. Rolfes,
    R.P. Brinkmann, P. Awakowicz:
    The Multipole Resonance Probe as a powerful diagnostic tool for industrial plasma processes
    82nd Annual Meeting of the DPG, Erlangen-Nürnberg, 2018.
  • C. Wölfel, S. Kockmann, P. Awakowicz, J. Lunze:
    Sputter processes: Neural network based modeling and control
    1st International Conference on Data-Driven Plasma Science, York, 2018.
  • M. Oberberg, C. Wölfel, D. Bockhorn, J. Lunze, P. Awakowicz:
    The Multipole Resonance Probe: A powerful sensor for plasma process monitoring and control
    1st International Conference on Data-Driven Plasma Science, York, 2018.
  • C. Wölfel, M. Oberberg, D. Bockhorn, P. Awakowicz, J. Lunze:
    Electron Plasma Frequency Feedback Control for Reactive RF Magnetron Sputtering Processes
    61st Annual Technical Conference Proceedings, Orlando, USA, 2018.

2017


  • D. Engel, D. Krüger, C. Wölfel, M. Oberberg, J. Lunze, P. Awakowicz, R.P. Brinkmann:
    Efficient model for active control of radio frequency magnetron sputtering
    18. Fachtagung für Plasmatechnologie, Göttingen, 2017.
  • C. Wölfel, P. Awakowicz, J. Lunze:
    Model reduction and identification of nonlinear reactive sputter processes
    Proc. of the 20th IFAC World Congress, pp. 14292-14298, Toulouse, France, 2017.
  • C. Wölfel, P. Awakowicz, J. Lunze:
    Tuning Rule for Linear Control of Nonlinear Reactive Sputter Processes
    Proc. of the 21st International Conference on Process Control (PC), pp. 109-114, Štrbské Pleso, Slovakia, 2017.
  • C. Wölfel, P. Awakowicz, J. Lunze:
    Robust high-gain control of nonlinear reactive sputter processes
    Proc. of the 1st IEEE Conference on Control Technology and Applications, pp. 25-30, Hawai'i, USA, 2017.
  • C. Wölfel, R.P. Brinkmann, P. Awakowicz, J. Lunze:
    Ein Ansatz zur Modellierung und Regelung reaktiver Zerstäubungsprozesse
    GMA-FA 1.30 Modellbildung, Identifikation und Simulation in der Automatisierungstechnik, Anif, 2017.
  • C. Wölfel, S. Kockmann, P. Awakowicz, J. Lunze:
    Model identification of nonlinear sputter processes
    Proc. of the 17th International Conference on Control, Automation and Systems, pp. 182-187, Jeju, Korea, 2017.
  • C. Wölfel, R.P. Brinkmann , P. Awakowicz, J. Lunze:
    Control-oriented modeling and stabilization of reactive sputter processes
    16th International Conference on Reactive Sputter Deposition, Plzeň, Czech Republic, 2017.
  • C. Wölfel, S. Kockmann, P. Awakowicz, J. Lunze:
    Neural network based linearization and control of sputter processes
    Proc. of the 11th Asian Control Conference, pp. 2831-2836, Gold Coast, Australia, 2017.
  • M. Oberberg, M. Fiebrandt, S. Ries, C. Wölfel, P. Awakowicz:
    The application of the multipole resonance probe to industrially relevant processes

    70th Annual Gaseous Electronics Conference, Pittsburgh, USA, 2017.

2016


  • D. Engel, D. Krüger, C. Wölfel, M. Oberberg, J. Lunze, P. Awakowicz, R.P. Brinkmann:
    Global model for active control of capacitive radio frequency magnetron discharges
    69th Annual Gaseous Electronics Conference, Bochum, Germany, October 13, 2016.

2015


  • C. Wölfel, M. Oberberg, D. Krüger, J. Lunze, R.P. Brinkmann, P. Awakowicz:
    Nutzung von Plasmadiagnostik zur Regelung eines reaktiven Sputterprozesses
    23. Dresdner Vakuumtechnische Kolloquium (NDVaK) Beschichtung und Modifizierung von Kunststoffoberflächen, Dresden, 2015.
  • C. Wölfel, M. Oberberg, J. Lunze, P. Awakowicz:
    Control orientated modeling and analysis of a reactive (O2) sputter (Ti) process
    WELTPP-18, Kerkrade, 2015.

Supervised theses:

2022:

  • Beobachterkonzepte für plasmabasierte Oberflächenprozesse
    Fabian Schneider, Master's thesis, running.

2017:

  • Identifikation eines Plasmaniederdruckreaktors mittels Neuronaler Netze
    Sven Kockmann, Master's thesis, March 2017.
  • Erprobung eines Ansatzes zur linearen Regelung von reaktiven Zerstäubungsprozessen
    Engin Polat, Master's thesis, May 2017.
  • Stabilisierung reaktiver Sputterprozesse mittels einer multipolresonanz- und Lambdasonde
    Dirk Bockhorn, Master's thesis, October 2017.

2016:

  • Identifikation und Parametrierung eines Präzisions-Massenflussreglers
    Sebastian Middeke, Bachelor's thesis, August 2016.

2015:

  • Identifikation eines Vakuumsystems zur plasmagetriebenen Abscheidung von Dünnfilmen
    Hamza Bouroum, Bachelor's thesis, October 2015.